[institut] Prezentacije u okviru Erasmus+ programa saradnje izmedju Univerziteta u Beogradu i Politehnickog univerziteta u Madridu
Dusko Latas
latas at ipb.ac.rs
Mon Oct 17 13:10:26 CEST 2016
Poštovane koleginice i kolege,
Tokom sledeće nedelje na Fizičkom fakultetu i Institutu za fiziku biće
održane prezentacije u okviru Erasmus+ programa saradnje između
Univerziteta u Beogradu i Politehničkog univerziteta u Madridu, Španija,
po sledećem rasporedu:
U utorak, 18. oktobar: Fizički fakultet, 12:00, sala 661, prezentacija
programa i predavanje:
Nobel Prize winning materials changing the world: GaAs, GaN and graphene
Predavači: Dr. Jose María Ulloa, Dr. Žarko Gačević and Dr. Jorge Pedrós
Institute for Systems based on Optoelectronics and Microtechnology
(ISOM), Universidad Politecnica de Madrid
U sredu, 19. oktobar: Fizički fakultet, 11:00, sala 661, seminari:
Novel GaAs-based nanostructures for third generation solar cells,
predavač: Dr. Jose María Ulloa
GaN nanowires: from quantum light emitters to nanotransistors,
predavač: Dr. Žarko Gačević
U petak, 21. oktobar: Institut za fiziku u Beogradu, 14:00, čitaonica
"dr Dragan Popović", SCL seminar:
Active plasmonics in graphene using surface acoustic waves, predavač:
Dr. Jorge Pedrós
U okviru ove saradnje, na raspolaganju su stipendije za razmenu za
studente osnovnih, master i doktorskih studija, u trajanju od 6 meseci,
tokom drugog semestra akademske 2016/2017. godine, kao i za razmenu
nastavnog osoblja i istraživača. Dostupne mobilnosti u pozivu koji se
zatvara 31. oktobra 2016. u 14:30 su:
-za nastavno osoblje i istraživače: jedna mobilnost od 30 dana i jedna
od 15 dana, -za studente doktorskih studija: 4 studenta po 6 meseci, -za
studente master studija: 9 studenata po 6 meseci, -za studente osnovnih
studija: 4 studenta po 6 meseci.
Pozivamo sve zainteresovane studente, nastavnike i istraživače da
prisustvuju navedenim prezentacijama i predavanjima.
U nastavku su apstrakti predavanja:
Nobel Prize winning materials changing the world: GaAs, GaN and graphene
Could Albert Einstein have ever imagined that his newly discovered
phenomenon of stimulated emission would drive small and cheap
solid-state light emitters allowing for world-wide optical networking?
What if Thomas Edison was told that in a very near future the light will
be emitted from low-consumption displays consisting of billions of
perfectly ordered solid state crystals? Would Paul Drude ever believe
that virtually massless electrons will flow through solid-state devices
enabling their ultra-high speed operation?
The science-fiction ultimately becomes reality thanks to materials such
as GaAs, GaN and graphene. What is next? Nanostructure-based solar cells
for clean energy harvesting? Single photon sources for quantum
networking? 3D computers breaking Moore’s law limitations?
Supercapacitors enabling long-distance electric transportation?
Three young researchers working in the clean rooms of the Polytechnic
University of Madrid will share their views on the past and future of
the three Nobel-prize winning materials which are changing the world as
we know it. They will encourage students to join their research
conducted in highly competitive fields of nanotechnology, within the
scope of Erasmus+ mobility.
Novel GaAs-based nanostructures for third generation solar cells
Third generation solar cells (SC) are being intensively investigated
today as a main route towards high efficiency photovoltaics. Limitations
in main approaches, such as multi-junction solar cells (MJSC) or
intermediate band solar cells (IBSC) are nowadays due to the lack of
materials and nanostructures with the required properties and band
alignments. This is hindering the realization of MJSCs and IBSCs with
the optimum designs. Today, GaAs-based epitaxy is starting to be mature
enough to allow the design of complex nanostructure architectures with
an unprecedented freedom. We propose a novel class of Sb-containing
nanostructures based on GaAs that could lead to significant improvements
in the development of third generation solar cells. Strain and band
structure engineering strategies involving designs with different
dimensionality will be discussed. In particular, lattice-matched
GaAsSb/GaAsN type-II supperlattices are proposed as the optimum
candidate to become the 1.0-1.15 eV layer in three- and four-junction
SCs, while InAs/GaAs quantum dots with a modified thin (Al)GaAsSb
capping layer could lead to enhanced single-junction SCs and IBSCs.
GaN nanowires: from quantum light emitters to nanotransistors
In the late 1990s several groups discovered that the growth of GaN with
extraordinary crystal quality was possible on a variety of commercial
substrates in the form of self-assembled nanowires, achieved via a
simple catalyst-free growth method (bottom-up). While the catalyst-free
approach enables an exceptional chemical purity, the high nanowire
surface-to-volume ratio yields GaN nanowires with a virtually perfect
crystal structure. This talk will summarize a recent progress in the
fabrication of GaN nanowires and their employment in photonic and
electronic nanodevices, such as quantum light emitters (single photon
sources) and field effect nanotransistors. The fabrication and
characterization of single photon sources, relying on a pencil-like
InGaN/GaN dot-in-a-wire structure will be presented. These sources emit
linearly polarized single photons over a wide spectral range and are
suitable for high-temperature operation. Their realization is an
important step toward quantum communications. Next, the fabrication and
characterization of a metal-semiconductor field effect transistor,
relying on a GaN:Si nanowire will be given. The nanowires are processed
horizontally, employing a semi-cylindrical top Ti/Au Schottky gate. The
final NW-FETs (non-planar devices) are characterized by an improved
channel electrostatic control. Their realization is an important step
toward "3D computer" architectures. Finally, the performances of the
hereby presented single photon sources and nanowire transistors are
systematically compared to similar devices realized via different
fabrication methods within the III-nitride material system.
Active plasmonics in graphene using surface acoustic waves
In comparison to conventional plasmonics, the tunability of graphene
plasmons offers unique possibilities for applications in metamaterials,
quantum optics control, biosensing, and light harvesting. However, most
of the techniques developed so far for coupling light into graphene
plasmons do not offer active control of the coupling mechanism. We have
recently demonstrated a method to couple far-field radiation into
propagating graphene plasmons by periodically deforming a continuous
graphene sheet with an electrically generated surface acoustic wave
(SAW). This mechanism allows to create a tunable optical grating without
the need of any patterning in either the graphene layer or the
substrate, thus eliminating edge scattering and fragility issues. An
interdigital transducer (IDT) on a piezoelectric film is used to launch
the SAW across the graphene sheet. By diffraction at the grating,
incident laser light can overcome the momentum mismatch and excite
propagating plasmons in the graphene sheet. This approach permits to
efficiently control the graphene plasmons both temporally and spatially.
Thus, the propagating plasmons can be switched electrically via the
high-frequency signal at the IDT and the generated plasmon wavefronts
can be shaped by tailoring the IDT design. Moreover, the IDT technology
ensures the easy fabrication of graphene plasmonic devices by the
microelectronics industry. In this talk, we will briefly review the
different methods used so far for the generation of graphene plasmons,
before presenting the details of our novel SAW-assisted approach. We
will present the hybridized graphene plasmon-phonon dispersion in the
graphene/piezoelectric structures, as well as the design and fabrication
technology of the plasmonic devices, including the transfer of graphene
to various piezoelectric materials. We will finally discuss different
SAW-mediated plasmon functionalities based on several engineered device
geometries.
Pozdrav,
Duško Latas
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