[institut] Seminar Fizickog fakulteta

[Mirzeta Savic]

PONEDELJAK 16. jul, 13:15 časova, fizički amfiteatar, sala 661, Studentski trg 12, III sprat.   


Predavac
Martin Kirchner


Title:
Electron Beam Lithography and its Applications in Research Labs

Abstract:
Since the invention of the electron beam microscope in 1931 by Ernst Ruska the technology of electron beam instruments is now in a mature 
state. Tens of thousands of electron microscopes are installed worldwide and are used for high resolution microscopy in all fields of research 
and inspection.

This presentation however is about the use of focused electron beam lithography tools for high resolution lithography. In this discipline 
the electron beam is used to define structures on nano and micro scale. The principle of the (resist based and mask less) lithography process 
will be explained along with the basics of instrumentation. Emphasis will be put on the applications of focused electron beam lithography in 
research. Application examples from various fields including electronics, photonics, plasmonics and mechanics will be presented.

Keywords: Electron sources/optics; electron beam lithography tools; electron beam lithography process chain; resolution; overlay; stitching; 
proximity effect correction; Applications: carbon nano tubes (CNT), graphene, nanowires, sensors, transistors, nano (electro) mechanical devices (NEMS), optical devices (security labels, photonic chips).


Presentation time:

About 40 to 45 minutes