| Low temperature plasmas have had a very broad range of applications
ever since their discovery. However, recent developments in the dextrous
handling of dry etching non-equilibrium plasma has attracted a great common
interest that has driving force behind the major developments in diagnostic,
theoretical, and numerical techniques during the past two decades. A greater
fundamental understanding of the kinetics of radio-frequency (rf) plasmas
and their interaction with surfaces in regard to the process of large
scale integrated circuits has been achieved through the cooperation between
academia and industry. At the same time, new applications have become
possible, and our recently revealed basic understanding of low temperature
rf plasmas has diffused to other areas of plasma physics. Each chapter
of this book is edited in the same form as the article collected in the
special issue of Applied Surface Science, which is published in memory
of the International Workshop on Basis for Low Temperature Plasma Applications
at Hakone in Japan on July 24 - 25 of 2001. The basic goal in the selection
of topics was to cover the range of issues that represent the building
blocks of the complex, "vertically integrated" plasma simulation
schemes including surface processes. We also showed examples of integrated
codes and how they are implemented in the development of new strategies
of plasma processing. Such codes may be used both in modern experiments
and in the computer aided design and control of the plasma devices of
the next generation. These are based on the transport theory of electrons,
ions, and neutrals, as well as on numerical modellings and on the available
collision and transport data describing gas and surface phases. We also
cover some aspects of simulation and modeling aimed at higher density
plasmas. All the chapters present a relatively complete review of the
developments in these fields in the past two decades as well as a review
of their current status of development. We achieved an excellent blend
of research reviews from both academia and industry. We hope that this
volume may be used as a guide for future developments in both the science
and in the application of low temperature rf plasmas. |
| Table of contents. 1. Kinetic phenomena in electron transport in radio
frequency fields (Z.Lj. Petrovic, Z.M. Raspopovic, S. Dujko, T. Makabe).
2. Development of swarm transport theory in radi-frequency electric and
crossed electric and magnetic fields (R.D. White, K.F. Ness, R.E. Robson).
3. Temporal and spatial relaxation in low temperature plasmas (R. Winkler,
D. Loffhagen, F. Sigeneger). 4. Surface chemistry associated with plasma
etching processes (D.B. Graves, D. Humbird). 5. Development of optical
coputerised tomography in CCP and ICP for plasma etching (T. Makabe, Z.Lj.
Petrovic). 6. Negative ions in processing plasmas and their effect on
the plasma structure (A. Kono). 7. Measurement techniques of radicals,
their gas phase and surface reactions in reactive plasma processing (M.Hori,
T. Goto). 8. Spatially resolved CF, CF2, SiF and SiF2 densities in fluorocarbon
containing inductively driven discharges (G.A. Hebner). 9. Vertically
integrated computer aided design for device processing (T. Makabe, K.
Maeshige). 10. Application and simulation of low temperature plasma processes
in semiconductor manufacturing (P.L.G. Ventzek, S. Rauf, P.J. Stout, D.
Zhang, W. Dauksher, E. Hall). 11. Development of high-density plasma reactor
for high-performance processing and future prospects (S. Samukawa). 12.
Recent progress in the understanding of electron kinetics in low-pressure
inductive plasmas (U. Kortshagen, A. Maresca, K. Orlov, B. Heil). 13.
Modelling of magnetron sputtering plasmas (C.H. Shon, J. K. Lee). 14.
Dielectric film etching in semiconductor device manufacturing - Development
of SiO2 etching and the next generation plasma reactor (M. Sekine). 15.
Efficiency of ac plasma display panels from diagnostics and models (R.
Ganter, Th. Callegari, L.C. Pitchford, J.P. Boeuf). 16. Electron interactions
with plasma processing gases: Present status and future needs (L.G. Christophorou,
J.K. Olthoff). 17. Database in low temperature plasma modelling (Y. Sakai).
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